ASML and Zeiss explore Hyper NA lithography for smaller chip features

Engineers at ASML and Carl Zeiss describe a potential successor to today’s High NA lithography tools in a peer-reviewed paper. Reuters, via The Economic Times, reports that the proposed Hyper NA system could print smaller features while reusing much existing technology, with readiness roughly a decade away. Development has begun, but ASML has not committed to producing the machine.

DTT summary based on The Economic Times's report. The full article is on the publisher's site.